water treatment plant for semiconductor and electronics industry

The semiconductor industry uses a large amount of ultrapure water to rinse contaminants from the surface of the silicon wafers that are later turned into computer chips used in devices we use every day. The ultrapure water used in semiconductor industry is by definition extremely low in contamination,for the risk that the contamination from the chemical residue and particles may end up back in the UPW feed water and result in product defects. Modern Ultrapure Water systems are very effective at removing ionic contamination down to parts per trillion levels (ppt) whereas organic contamination of ultrapure water systems is still in the parts per billion levels (ppb).              

The reverse osmosis technology is the most advanced energy-efficient and highly efficient separation technology. Its principle is that under a pressure which is higher than the osmosis pressure, by means of interception performance of only allowing the water molecules to go through the reverse osmosis membrane, and then it can effectively separates the solute and solvent, so as to achieve the goal of getting pure water. The pore size of reverse osmosis membrane is 0.0001 microns, can effectively remove dissolved salt, colliod, bacterium, virus and most organic from water. Water treatment machine consists of pre-treatment system and reverse osmosis water filter system, pre-treatment including quartz sand filter, active carbon filter and water softener. Pre-treatment system is a good protection of reverse osmosis water filter system.